D2S Receives Milestone Order for 50th GPU-Based Computational Design Platform for Optimizing Semiconductor Manufacturing
GPU Acceleration Key to Enabling Curvilinear Photomask Features for the Widest Semiconductor Process Windows
Last month, NVIDIA CEO
GPU Acceleration Revolutionizing Semiconductor Design and Manufacturing
Computing applications used in semiconductor design and manufacturing have ever-increasing requirements for speed, accuracy and reliability as the leading-edge nodes – fueled by high-performance computing and artificial intelligence (specifically deep learning) – enter the 3-nm era and beyond. These applications include inverse lithography technology (ILT) to produce curvilinear shapes on photomasks, mask process correction (MPC) for multi-beam mask writing to process these incredibly complex mask shapes, curvilinear mask and wafer simulation and verification, and deep learning for photomask and semiconductor manufacturing.
Curvilinear mask features have been shown not only to print more accurately, but also to print more reliably, which is good for both mask and wafer quality. At the same time, leading-edge mask making is inherently pixel-based – from ILT that computes the desired mask shapes in the pixel domain in order to optimize wafer performance, including D2S TrueMask® ILT; and multi-beam mask writers that expose the resist on the mask using hundreds of thousands of eBeam pixels in parallel; to mask inspection and metrology systems, which take digitized (pixel-based) pictures to verify and monitor mask quality. The shift to the pixel domain for leading-edge masks naturally leads to the use of GPU-accelerated computing, which excels in pixel-domain computation(2). In addition, GPU-based computing is a foundation for most deep learning computations, which have become important for complex, computation-heavy applications.
D2S CDPs combined with D2S GPU-accelerated software solutions enable simulation-based accurate manipulation and analysis, particularly for curvilinear shapes. D2S software applications are based on NVIDIA CUDA, a parallel computing platform and programming model for GPUs. The latest seventh-generation CDP from D2S is powered by NVIDIA Ampere architecture-based A40 GPUs, and achieves more than 1.8 PetaFLOPS (SP) of computing power in a one-rack CDP.
According to
Note to Editors Attending DAC 2023
References
(1) Caulfield, B. (2023,
(2) Fujimura, A. (2023,
About D2S
D2S is a supplier of GPU-accelerated solutions for semiconductor manufacturing. The company provides simulation-based custom solutions to leading equipment partners and D2S TrueMask® solutions to photomask and wafer manufacturers. D2S TrueMask solutions use the D2S Computational Design Platform to enable advanced photomask designs using complex rectilinear and curvilinear shapes for superior wafer quality within practical, cost-effective write-times. D2S is the managing sponsor of the eBeam Initiative and a founding member of the Center for Deep Learning in Electronics Manufacturing (CDLe). Headquartered in
D2S, the D2S logo and TrueMask are registered trademarks of D2S, Inc.
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SOURCE D2S
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